}
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    • Large Area Sputter Coating Unit Components Large Area Sputter Coating Unit Components , Large Area Sputter Coating Unit Components , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( A ) Cf-Based Flange Of Appropriate Size To Accommodate 2” Mag, IIT Delhi, Hauz Khas, New Delhi-Delhi

    Indian Institute Of Technology has published Large Area Sputter Coating Unit Components Large Area Sputter Coating Unit Components , Large Area Sputter Coating Unit Components , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( A ) Cf-Based Flange Of Appropriate Size To Accommodate 2” Mag. Submission Date for this Tender is 29-09-2021. Coats and Jackets Tenders in IIT Delhi, Hauz Khas, New Delhi Delhi. Bidders can get complete Tender details and download the document.




    Tender Notice

    29050804
    Large Area Sputter Coating Unit Components Large Area Sputter Coating Unit Components , Large Area Sputter Coating Unit Components , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( A ) Cf-Based Flange Of Appropriate Size To Accommodate 2” Mag
    Open Tender
    Indian
    Delhi
    Iit Delhi, Hauz Khas, New Delhi
    29-09-2021

    Tender Details

    Large Area Sputter Coating Unit Components Large Area Sputter Coating Unit Components , Large Area Sputter Coating Unit Components , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( A ) Cf-Based Flange Of Appropriate Size To Accommodate 2” Magnetron, , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( B ) Cf-Based Flange Of Appropriate Size To Accommodate 3” Magnetron , , Ultra-High Vacuum Compatible Sputter Magnetron Sources ( C ) Cf-Based Cluster Flange Of Appropriate Size To Accommodate 6” Dia. Magnetron Sources , Gate Valves: ( A ) Cf-63 / 2.5 Dia Flange Size, , Gate Valves: ( B ) Cf-100 / 4 Dia Flange Size, , Gate Valves: ( C ) Cf-200 / 8 Dia Flange Size , Deposition Chamber Pressure Measuring System , Rf Generator And Matching Network Of Power Rating ³1000 Watts @13.56 Mhz , Pulsed Dc Supplies Of Power Rating ³750 W , 3 Mass Flow Controllers , Turbo-Molecular Pump , Film Thickness Monitor , 4-Pocket And 4 Cc Electron Beam Evaporation Source With Tetrode Tube Based Power Supply 6 Kw And Having Digital Sweep

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