Machines And Apparatus With Individual Functions – Acquisition Of Equipment For Engraving Thin Layer Materials. This Equipment Must Be Capable Of Etching Different Materials From The Semiconductor Range In Thin And Deep Layers With A Process Involving Fluorinated Chemistry. It Must Also Allow The Deposition Of A Passivating Layer In-Situ In Order To Be Able To Engrave At Micron Depths Similar To The Bosch Process.
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