Project Name: Vacuum magnetron sputtering coating equipment procurement project Tenders are invited for It is Proposed to be Purchased, Which can Realize Thin Film Deposition of 8 Inches of Substrate, And can Prepare Thin Film Deposition of Sulfur Compounds, Oxides, Au, Ag, Ti, Sio2 and Other Materials with a Thickness Difference of ± 5% (8 Inches). Equipped with at Least 1 Dc and 1 Rf Power Supply, The Co-Splash Deposition of 2 Target Sites can be Achieved. With an Argon Plasma Bombardment to Achieve Slight Etching. Laboratory Research and Processing of Semiconductor Material Applications, Mainly Used for the Film Deposition of Sulfur Compounds, Indium Tin Oxide, Au, Ag, Ti, Sio2 and Other Materials on the Substrate. Products List: 1: Vacuum Magnetron Sputtering Coating Equipment Place of Implementation: Shanghai China Beginning of Selling Bidding Documents: 2024-07-09 Ending of Selling Bidding Documents: 2024-07-16 Price of Bidding Documents: Free Deadline for Submitting Bids/Time of Bid Opening (Beijing Time): 2024-07-30 09:30 Tender Link : https://www.chinabidding.com/en/detail/259805124-BidNoticeEn.html
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